Kayan aiki Sunan: Cikakken atomatik Ion sputter Model: ETD-800

Ka'ida: Diode DC sputtering

Kayan aiki Sunan: Ion sputter Model: ETD-900M

Ka'ida: magnetron sputtering

A cikin magnetron sputtering, saboda motsi lantarki da Lorentz karfi a magnetic filin, su motsi hanya zai faru karkata ko ma samar

Raw spiral motsi, da motsi hanya ya kara tsawo, saboda haka ya kara yawan lokacin da haɗuwa da aiki gas kwayoyin, sa plasma yawa kara, don haka magnetron sputtering kudin da aka inganta sosai, kuma za a iya aiki a karkashin ƙananan sputtering ƙarfin lantarki da iska matsin lamba. A lokaci guda, bayan haɗuwa da yawa, lokacin da lantarki ya rasa makamashi ya isa anode, ya zama lantarki mai ƙarancin makamashi, don haka ba zai sa substrate ya yi zafi ba.

ETD-800 sigogi:

Bayani: 260mm × 307mm × 260mm (W × D × H)

Bayani na wutar lantarki: 220V / 50HZ

Manufa (saman lantarki): 50mm × 0.1mm (D × H)

Manufa: Au

Injin samfurin dakin: Borosilicate gilashi 115mm × 100mm (D × H)

Lokaci: Zui tsawon lokaci: 3600S

inji famfo: 1L / S

Zui Babban ƙarfin lantarki: -1200 DCV

ETD-900M sigogi:

Bayani: 300mm × 360mm × 380mm (W × D × H)

Manufa (saman lantarki): 50mm × 0.1mm (D × H)

Manufa: Au (daidaitacce)

Samfurin dakin: Borosilicate gilashi 160mm × 120mm (D × H)

Manufa girma: Ф 50mm

真空指示表： zui 高真空度： ≤ 4X10-2 mbar

Ion halin yanzu mita: Zui Babban halin yanzu: 50mA

Lokaci: zui Tsawon lokaci: 0-360S

Mini injin iska bawul: Haɗa φ 3mm bututu

samuwa gas: Multiple

Babban ƙarfin lantarki: -1600 DCV

Injin famfo: misali daidaitawa 2L / S (gida VRD-8)

Features da Amfani:

Amfani da ETD-800:

Shirya samfurin binciken lantarki microscope (SEM) don dakin gwaje-gwaje na electroscopy.

Abubuwa:

Za a iya cimma rufi na fine granules ta hanyar maye gurbin daban-daban manufa (zinariya, platinum, azurfa, da dai sauransu).

Daya-danna aiki, sauki don amfani.

Amfani da ETD-900M:

Shirya samfurin binciken lantarki microscope (SEM) don dakunan gwaje-gwaje na electroscopy, ƙirƙirar gwajin lantarki na kayan da ba na gudanarwa ba.

Abubuwa:

1, Simple, tattalin arziki, abin dogaro, da kyau bayyanar.

2, daidaitaccen sputtering halin yanzu da injin dakin matsin lamba don sarrafa saurin rufi da kuma girman granules.

3, SETPLASMA hannu farawa button za a iya pre-saita matsin lamba da kuma sputtering halin yanzu kauce wa lalacewar da ba dole ba ga membrane.

4, inji kariya iya kauce wa inji too low haifar da na'urar gajeren kewayawa.

5, a lokaci guda za a iya samun rufi na finer granules ta hanyar maye gurbin daban-daban manufa (zinariya, platinum, iridium, azurfa, jan ƙarfe, da dai sauransu).

6, ta hanyar shiga daban-daban inert gas don cimma more tsabta rufi.